distant destinations: Static units are usually situated remotely, escalating cost and decreasing General method efficiency.
Software & TCU application calibration procedures change exterior take a look at devices not made use of consistently for verifying
While using the POU3500, you'll be able to attain unparalleled brings about etch efficiency, chamber uptime, diminished expense of possession and fab space utilization – all although strengthening your course of action trustworthiness.
Originally Started in 1985, our company has developed right into a acknowledged leader in furnishing temperature Management units to the global semiconductor field.
LAUDA-Noah will, for the buyer's retrofit analysis, check and regulate its fluid temperature control profiles to match an existing TCUs' to be able to ensure a sleek approach integration more info through DAQ.
The accuracy of your POU 3300 allows for impartial control of the process fluid temperature into the wafer chuck inside of +/- 0.1 °C of set stage, as well as the rapid reaction time in the technique makes it possible for for optimum wafer-to-wafer repeatability through the etch procedure.
All static TCUs demand extra cooling & heating capacities because of their quite substantial method fluid reservoirs. The process fuid reservoir on LAUDA-Noah's dynamic temperature Regulate procedure is lower than one gallon.
With our unit strategically mounted somewhere around six ft from the chamber, we reach a way more exact looking through of the chuck temperature. This solution ensures regular temperature throughout the production great deal, resulting in improved wafer-to-wafer CD uniformity.
the information pertains to your 300mm chamber temperature profile for the duration of a significant facet ratio Etch course of action, operating at incredibly significant RF electrical power conditions (~three.8kW). The compelling aspects of this knowledge established are:
LAUDA-Noah is meeting these new challenges and it has incorporated Electricity preserving know-how in techniques which are welcoming for the natural environment and possess a cheap to operate.
The data set here is from a 200mm volume production wafer fab and Evidently illustrates the benefit of the LAUDA-Noah POU system.
The POU3300 program gives dynamic temperature Charge of the process chamber cathode / electrode / anode and can be synchronized with any etch system.
verified; TEs' signify just one Portion of a chiller's style and design. The switching & Command solutions employed by a chiller will impact the TEs' trustworthiness.
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We call for a lot less cooling/heating capacity for the same application to be a static TCU due to our compact reservoir quantity.